There is a growing demand for innovative photolithographic imaging materials driven by continual advancements in micro- and nanofabrication of semiconductor devices. Consequentially, these demands place pressure on chemically amplified resists (CAR), to not only perform microlithography under intensified production pressures, but also to address increasing environmental challenges (e.g., non-sustainable feedstocks). The lecture will discuss our collaborative effort towards the “greening” of the CAR lithographic process through a series of novel methacrylate based monomers, homo- and terpolymers, and will include comment on their lithographic evaluation.